With wafer holders in several sizes (4, 6, 8 and 12 inch), the MX8R / MX12R is designed for wafer and flat-panel display inspection — supporting wafers up to 300 mm in diameter and FPDs up to 17 inches. An upgraded ergonomic design makes operation more comfortable, flexible and fast.
Every control is designed to reduce fatigue and speed up long inspection shifts.
The viewing head tilts from 0° to 35° to adjust the eye-point height, giving every user the best viewing angle — relieving fatigue during long operation and noticeably improving efficiency.
Forward and backward buttons switch magnification quickly with accurate, repeatable positioning. A mechanical switching mode effectively extends the service life of the nosepiece.
The nosepiece and aperture diaphragm are electrically controlled from buttons on the front of the base — easy, convenient operation that improves working efficiency.
With six leveling feet, the MX12R metal frame has a low centre of gravity and high stability — resisting knocks to keep images steady.
Supporting bright field, dark field, polarizing and DIC, the MX12R is widely used for semiconductors, FPD, circuit packaging, PCB, materials, cast metal and ceramic parts, abrasive tools and more.
| Item | MX12R |
|---|---|
| Optical system | Infinity color-corrected optical system |
| Observation | Bright field / Dark field / Polarizing / DIC |
| Viewing head | Tilting trinocular head (erect image), 0 – 35° adjustable; interpupillary distance 50 – 76 mm; splitting ratio 100:0 or 0:100 |
| Eyepiece | High eye-point wide-field plan eyepiece PL10×/25 mm, adjustable diopter; reticle attachable |
| Objectives | BD semi-APO DIC objectives 5× / 10× / 20× / 50× / 100× Long working distance BD semi-APO DIC objective 20× Long working distance BD semi-APO objectives 50× / 100× |
| Nosepiece | Electronic BD sextuple nosepiece with DIC slot |
| Frame | |
| Reflected | Low-position coaxial focus mechanism, coarse range 35 mm, fine precision 0.001 mm; upper limit and tension adjustment; built-in 100 – 240 V wide-voltage system |
| Transmitted & reflected | Low-position coaxial focus mechanism, coarse range 35 mm, fine precision 0.001 mm; upper limit and tension adjustment; built-in 100 – 240 V wide-voltage system |
| Stage | |
| Mechanical stage | 14 × 12″ three-layer stage with low-position coaxial adjustment; size 718 × 420 mm; travel 356 × 305 mm; clutch handle for quick movement; glass plate for reflected use |
| Electronic stage | 495 × 641 mm; travel 306 × 306 mm; repeat positioning accuracy (3 + L/50) µm |
| Optics & accessories | |
| Illumination | BD reflected illuminator with electronic variable aperture and field diaphragm (center adjustable); bright / dark field switch; slots for filters and polarizing kit |
| Camera adapter | 0.5× / 0.65× / 1× C-mount adapter |
| Others |
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Tell us your wafer size, panel format and inspection modes — we'll configure the right MX8R / MX12R system.
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